It is chlorine-free electronic grade diisopropylaminosilane with ultra-high purity and ppb-level control of metal impurities. The amino ligands are mild and easy to remove, featuring excellent low-temperature thermal decomposition and superior film step coverage without chloride contamination risk, suitable for precise ALD film-forming systems of advanced chips.
Electronic Grade Diisopropylaminosilane
CAS # : 908831-34-5
Synonym : DIPAS
Technical specs :
Purity, By GC: ≥99.9%; Specification, By ICP-MS: ≥99.9999995%; TMI ≤5ppb
Industry/application :
Widely used for deposition of chlorine-free ultra-thin conformal silicon nitride and silicon oxide barrier layers in advanced processes of 3nm and below, fabrication of passivation films for flexible displays and RF devices, serving as an eco-friendly chlorine-free silicon source to replace traditional chlorosilanes.
Certifications :
ISO,COA,MSDS,TDS