Ultra-high purity electronic grade titanium tetrachloride with metal impurities strictly controlled at ppb level, stable volatility and uniform thermal decomposition. The formed titanium dioxide/titanium nitride films have strong adhesion and stable deposition rate, suitable for CVD/ALD mass production lines of large-size wafers.
Electronic Grade Titanium Tetrachloride
CAS # : 7550-45-0
Synonym : TiCl
Technical specs :
Purity, By GC: ≥99.99%; Specification, By ICP-MS: ≥99.999999%; TMI ≤10ppb
Industry/application :
Core metal precursor for semiconductor titanium-based thin films, used for IC metal gate barrier layers, high-k titanium oxide films of DRAM capacitors, photovoltaic cell anti-reflection coatings and optical lens coatings.
Certifications :
ISO,COA,MSDS,TDS