High-purity pentachlorodisilane containing Si-Si bonds and active hydrogen, with lower decomposition temperature than hexachlorodisilane, outstanding low-temperature film-forming capacity and superior conformal film coverage, suitable for ultra-low temperature ALD/CVD processes of next-generation advanced nodes.
Pentachlorodisilane
CAS # : 31411-98-0
Synonym : PCDS
Technical specs :
Purity, By GC: ≥99.9%; Specification, By ICP-MS: ≥99.9999995%; TMI ≤5ppb
Industry/application :
Targeted at advanced chips of 3nm and below and flexible electronic devices, used for ultra-thin conformal silicon nitride/silicon oxide film deposition, a dedicated precursor for novel low-temperature flexible semiconductor thin films.
Certifications :
ISO,COA,MSDS,TDS