Electronic grade high-purity tantalum precursor pentakis(dimethylamino)tantalum, halogen-free with easily thermally removable amino ligands. Dense and uniform tantalum oxide/tantalum nitride films can be deposited via low-temperature ALD with excellent dielectric performance and no residual metal ion contamination.
Pentakis (dimethylamino) tantalum
CAS # : 19824-59-0
Synonym : PDMAT
Technical specs :
Purity, By GC: ≥99.9%; Specification, By ICP-MS: ≥99.999999%; TMI ≤10ppb
Industry/application :
Dedicated tantalum source for ALD deposition of high-k tantalum oxide films for DRAM storage capacitors, tantalum nitride films for IC metal barrier layers, optical high-refractive coatings and insulating layers of flexible electronic devices.
Certifications :
ISO,COA,MSDS,TDS